The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2016

Filed:

Apr. 19, 2012
Applicants:

Martinus Jacobus Coenen, Eindhoven, NL;

Guido Friedrich Siemons, Stolberg, DE;

Inventors:

Martinus Jacobus Coenen, Eindhoven, NL;

Guido Friedrich Siemons, Stolberg, DE;

Assignees:

ASML NETHERLANDS B.V., Veldhoven, NL;

USHIO DENKI KABUSHIKI KAISHA, Tokyo-To, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/72 (2006.01); H05G 1/10 (2006.01); H05G 2/00 (2006.01); G03F 7/20 (2006.01); H04L 25/02 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); G03F 7/70033 (2013.01); G03F 7/70991 (2013.01); H04L 25/0278 (2013.01); H05G 2/003 (2013.01);
Abstract

A power supply for providing HV power to a lithography illumination source comprising a HV power source arranged to provide the HV power, a HV power transmission line arranged to transmit the HV energy from the HV power source and one or more RF terminations provided on one or more of an input end of the transmission line or an output end of the transmission line. The one or more RF terminations terminate the transmission line to reduce reflection of RF energy at the end of the transmission line.


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