The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2016
Filed:
Jul. 21, 2015
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Kevin W Zhang, San Diego, CA (US);
Michael Purvis, San Diego, CA (US);
Robert J Rafac, San Diego, CA (US);
Alexander Schafgans, San Diego, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); G02B 27/14 (2006.01); G02B 26/08 (2006.01); G01J 11/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/003 (2013.01); G01J 11/00 (2013.01); G02B 26/0825 (2013.01); G02B 27/141 (2013.01); H05G 2/005 (2013.01); H05G 2/008 (2013.01);
Abstract
A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.