The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2016
Filed:
May. 18, 2012
Yasunobu Someya, Toyama, JP;
Yuki Usui, Toyama, JP;
Masakazu Kato, Toyama, JP;
Tetsuya Shinjo, Toyama, JP;
Keisuke Hashimoto, Toyama, JP;
Ryo Karasawa, Toyama, JP;
Yasunobu Someya, Toyama, JP;
Yuki Usui, Toyama, JP;
Masakazu Kato, Toyama, JP;
Tetsuya Shinjo, Toyama, JP;
Keisuke Hashimoto, Toyama, JP;
Ryo Karasawa, Toyama, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
Whereas, conventionally, ashing had been used at the time of removal, the present invention provides a material for forming an organic hard mask that can be removed by an alkaline aqueous solution, and thus can be expected to reduce damage to the substrate at the time of the removal. A composition for forming an organic hard mask layer comprising: a polymer (A) including a structural unit of Formula (1) and a structural unit of Formula (2); a crosslinkable compound (B) including at least two of blocked isocyanate groups, methylol groups, or Calkoxymethyl groups; and a solvent (C), wherein an organic hard mask layer obtained from the composition for forming an organic hard mask layer is used at the lowest layer in a lithography process using a multi-layer film, wherein Rto Rhave the same definition as ones in the specification.