The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2016
Filed:
Feb. 28, 2013
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Kursat Bal, Arnhem, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
David Christopher Ockwell, Waalre, NL;
Arnold Jan Van Putten, Eindhoven, NL;
Han-Kwang Nienhuys, Utrecht, NL;
Maikel Bernardus Theodorus Leenders, Veghel, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/52 (2006.01); G03B 27/62 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70691 (2013.01); G03F 7/20 (2013.01); G03F 7/70066 (2013.01); G03F 7/70866 (2013.01); G03F 7/70933 (2013.01);
Abstract
A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.