The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2016
Filed:
Oct. 12, 2015
Applicant:
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Inventors:
Masaru Suzuki, Kuwana, JP;
Hiroyuki Mizuno, Kuwana, JP;
Assignee:
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/42 (2006.01); G01N 21/94 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01N 21/94 (2013.01); G01N 21/9501 (2013.01); G01N 2201/062 (2013.01); G01N 2201/10 (2013.01);
Abstract
According to one embodiment, a particle measurement mask includes a first mask substrate, a support member, and a particle measurement unit. The support member is arranged at a peripheral edge portion of a second main face of the first mask substrate, which is opposite to a first main face of the first mask substrate to come into contact with a mask stage. The particle measurement unit is arranged on a side surface of the support member, and configured to measure presence and absence of particles near the second main face.