Kuwana, Japan

Hiroyuki Mizuno

USPTO Granted Patents = 20 


 

Average Co-Inventor Count = 2.4

ph-index = 7

Forward Citations = 113(Granted Patents)


Location History:

  • Fuji, JP (1997 - 2000)
  • Chiba, JP (2003 - 2004)
  • Utsunomiya, JP (2003 - 2006)
  • Mie-ken, JP (2014)
  • Kanagawa, JP (1993 - 2015)
  • Yokohama, JP (1993 - 2018)
  • Kuwana, JP (2015 - 2021)

Company Filing History:


Years Active: 1993-2021

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20 patents (USPTO):Explore Patents

Title: Innovations of Hiroyuki Mizuno

Introduction

Hiroyuki Mizuno is a prominent inventor based in Kuwana, Japan. He has made significant contributions to the field of plasma processing and reflection mask technologies. With a total of 20 patents to his name, Mizuno's work has had a substantial impact on various industries.

Latest Patents

One of his latest patents is a restoration method for plasma processing apparatus. This method involves applying a restoration liquid from a coating part onto a consumed region of a component, controlling the positions of both the component and the coating part, as well as the application amount of the restoration liquid. The restoration liquid is then solidified on the component. Another notable patent is for a reflection mask and pattern formation method. This reflection mask includes a multilayer reflection film designed to reflect EUV light or soft X-rays. It features a periodic pattern arrangement region with first patterns and a non-periodic pattern arrangement region with second patterns, differing in reflectivity for the EUV light or soft X-rays.

Career Highlights

Mizuno has worked with notable companies such as Toshiba Corporation and Sumitomo Heavy Industries, Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas.

Collaborations

Throughout his career, Mizuno has collaborated with esteemed colleagues, including Masaru Suzuki and Masami Iseki. These partnerships have contributed to the advancement of his inventions and patents.

Conclusion

Hiroyuki Mizuno's contributions to the fields of plasma processing and reflection mask technologies highlight his innovative spirit and dedication to advancing technology. His extensive patent portfolio reflects his commitment to innovation and excellence in his field.

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