The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 29, 2016

Filed:

Aug. 01, 2013
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hiroshi Marumoto, Koshi, JP;

Koji Takayanagi, Koshi, JP;

Kenji Adachi, Koshi, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 19/00 (2006.01); H01L 21/67 (2006.01); B01D 36/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6715 (2013.01); B01D 19/0031 (2013.01); B01D 19/0036 (2013.01); B01D 36/001 (2013.01); H01L 21/67017 (2013.01);
Abstract

According to an embodiment of the present disclosure, a process liquid supply apparatus operating method is provided. The method includes filling a filter unit with a process liquid from an upstream side of the filter unit to a downstream side of the filter unit after newly mounting or replacing the filter unit and repeating a depressurization filtering process and a pressurization filtering process for a predetermined number of times. The depressurization filtering process depressurizes the process liquid in the downstream side of the filter unit and thereby allows the process liquid to permeate through the filter unit. The pressurization filtering process pressurizes the process liquid from the upstream side of the filter unit and thereby allows the process liquid to permeate through the filter unit.


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