The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Sep. 19, 2012
Mapper Lithography Ip B.v., Delft, NL;
Marc Smits, Punacker, NL;
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Abstract
A lithography system () comprising a radiation projection system () for projecting radiation onto a substrate, a substrate transport system () for loading and positioning the substrate to be processed in the path of the projected radiation, a control system () for controlling the substrate transport system to move the substrate, and a resist characterization system () arranged for determining whether a specific type of resist is suitable to be exposed by radiation within the lithography system. The resist characterization system () may be arranged for exposing the resist on a surface of the substrate with one or more radiation beams, measuring a mass distribution of molecular fragments emitted from the resist, predicting a growth rate of deposited molecular fragments on the basis of a growth rate model and the measured mass distribution, and comparing the expected growth rate with a predetermined threshold growth rate.