The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2016
Filed:
Nov. 17, 2014
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Markus Deguenther, Aalen, DE;
Vladimir Davydenko, Bad Herrenalb, DE;
Thomas Korb, Schwaebisch Gmuend, DE;
Frank Schlesener, Oberkochen, DE;
Stefanie Hilt, Aalen, DE;
Wolfgang Hoegele, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An illumination system of a microlithographic projection exposure apparatus includes an optical integrator having a plurality of light entrance facets each being associated with a secondary light source. A spatial light modulator has a light exit surface and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light on the spatial light modulator. An objective images the light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator. The light exit surface of the optical light modulator includes groups of object areas being separated by areas that are not imaged on the light entrance facets. The objective combines images of the object areas so that the images of the object areas abut on the optical integrator.