The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2016

Filed:

Jun. 15, 2012
Applicant:

Yu Guan, Pleasanton, CA (US);

Inventor:

Yu Guan, Pleasanton, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 15/02 (2006.01); G01N 21/93 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G01N 21/93 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01);
Abstract

The present invention includes providing a plurality of standard particles; providing a substantially crystalline material having one or more characteristic spatial parameters, disposing the plurality of standard particles proximate to a portion of the substantially crystalline material, acquiring imagery data of the plurality of standard particles and the portion of the substantially crystalline material, establishing a spatial relationship between the plurality of standard particles and the portion of the substantially crystalline material utilizing the acquired imagery data, and determining one or more spatial parameters of the plurality of standard particles utilizing the one or more characteristic spatial parameters of the substantially crystalline material and the established spatial relationship between the plurality of standard particles and the portion of the substantially crystalline material.


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