The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2016
Filed:
Jan. 27, 2014
Applicant:
Industrial Technology Research Institute, Hsinchu, TW;
Inventors:
Ding-Zheng Lin, Taipei, TW;
Tsung-Dar Cheng, Taipei, TW;
Hsiao-Feng Huang, Taoyuan, TW;
Ping-Chen Chen, Taipei, TW;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/65 (2006.01);
U.S. Cl.
CPC ...
G01N 21/658 (2013.01);
Abstract
The disclosure provides a surface-enhanced Raman scattering substrate, including: a surface-enhanced Raman scattering (SERS)-active substrate; a patterned hydrophilic region and a patterned hydrophobic region formed on the SERS-active substrate, wherein a water contact angle difference between the patterned hydrophilic region and the patterned hydrophobic region is in a range from about 29 degrees to about 90 degrees.