The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2016

Filed:

Jun. 13, 2014
Applicant:

Sumitomo Electric Industries, Ltd., Osaka-shi, Osaka, JP;

Inventors:

Keiji Ishibashi, Itami, JP;

Yusuke Yoshizumi, Itami, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/12 (2006.01); C30B 23/02 (2006.01); C30B 29/40 (2006.01); C30B 33/00 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
C30B 23/025 (2013.01); C30B 29/403 (2013.01); C30B 33/00 (2013.01); H01L 29/2003 (2013.01);
Abstract

A group III nitride crystal substrate is provided in which a uniform distortion at a surface layer of the crystal substrate represented by a value of |d−d|/dobtained from a plane spacing dat the X-ray penetration depth of 0.3 μm and a plane spacing dat the X-ray penetration depth of 5 μm is equal to or lower than 1.9×10, and the main surface has a plane orientation inclined in the <10-10> direction at an angle equal to or greater than 10° and equal to or smaller than 80° with respect to one of (0001) and (000-1) planes of the crystal substrate. A group III nitride crystal substrate suitable for manufacturing a light emitting device with a blue shift of an emission suppressed, an epilayer-containing group III nitride crystal substrate, a semiconductor device and a method of manufacturing the same can thereby be provided.


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