The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9497840 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 15, 2016

Filed:

Feb. 06, 2014
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventor:

Martijn Wehrens, Waalre, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); H05G 2/006 (2013.01);
Abstract

A method and apparatus for creating and utilizing dual laser curtains from a single laser source in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A polarizing beam splitter creates two beams of orthogonal polarization from a single laser, and the beams are used to generate two laser curtains. Sensors detect flashes from droplets of target material as they pass through the curtains. One sensor may detect the position of the droplets relative to a desired trajectory to the irradiation site so that the orientation of a droplet generator may be adjusted to direct subsequent droplets to the irradiation site, as in the prior art. A second sensor may detect each droplet as it passes through a curtain to determine when a source laser should generate a pulse so that the pulse will arrive at the irradiation site at the same time as the droplet, so that a signal may be sent to the source laser to fire at the correct time.


Find Patent Forward Citations

Wehrens, Martijn. (2016). System and method for creating and utilizing dual laser curtains from a single laser in an lpp euv light source (U.S. Patent No. 9497840). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9497840

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