The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2016

Filed:

Oct. 05, 2015
Applicant:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Inventors:

Holger Doemer, Bopfingen, DE;

Andreas Schmaunz, Oberkochen, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/02 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/023 (2013.01); H01J 37/28 (2013.01); H01J 2237/006 (2013.01); H01J 2237/10 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/2801 (2013.01);
Abstract

The system described herein determines a distance of a component of a particle beam device from an object to the particle beam device and sets a position of the component in the particle beam device. The component is moved from a first starting position of the component relatively in the direction of an object, which is located in a second starting position, until the component makes contact with the object. When the component makes contact with the object, an adjusting path covered by the component and/or the object during the movement is determined. The adjusting path runs along a straight line that joins a first point on the component in the first starting position to a second point on the object in the second starting position that is arranged closest to the first point on the component along this line. The adjusting path corresponds to the distance.


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