The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
Nov. 15, 2012
Applicant:
Spansion Llc, Sunnyvale, CA (US);
Inventor:
Rinji Sugino, San Jose, CA (US);
Assignee:
CYPRESS SEMICONDUCTOR CORPORATION, San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/458 (2006.01); H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45563 (2013.01); C23C 16/455 (2013.01); C23C 16/4583 (2013.01); C23C 16/4584 (2013.01); C23C 16/45578 (2013.01); C23C 16/45587 (2013.01); C23C 16/45591 (2013.01); H01L 21/67303 (2013.01);
Abstract
A method and apparatus to evenly distribute gas over a wafer in batch processing. Several techniques are disclosed, such as, but not limited to, angling an injector to distribute gas towards a proximate edge of the wafer, and/or reducing the amount of overlap in the center of the wafer of gas from subsequent gas injections.