The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2016
Filed:
Sep. 21, 2011
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Tammo Uitterdijk, De Bilt, NL;
Nicolas Alban Lallemant, Veldhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Tammo Uitterdijk, De Bilt, NL;
Nicolas Alban Lallemant, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.