The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2016
Filed:
Dec. 02, 2011
Wouter Frans Willem Mulckhuyse, Bussum, NL;
Pieter Willem Herman DE Jager, Middelbeers, NL;
Erwin John Van Zwet, Pijnacker, NL;
Wouter Frans Willem Mulckhuyse, Bussum, NL;
Pieter Willem Herman De Jager, Middelbeers, NL;
Erwin John Van Zwet, Pijnacker, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device.