The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2016
Filed:
Dec. 04, 2014
International Business Machines Corporation, Armonk, NY (US);
Yunlin Zhang, Wappingers Falls, NY (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
The present invention relates generally to metrology, and more particularly, to an apparatus and method of measuring multiple parameters of a structure or feature of a semiconductor device using a combination of stepwise optical metrology and a linear system of equations to generate an output as function of position. In an embodiment, a light beam having a width greater than the features to be measured may be shined on a first area of the semiconductor device to calculate a first average. The light beam may then be shined on a second area that overlaps the first area by at least one individual feature to calculate a second average. The averages may be entered into a system of linear equations which may then be solved to calculate an overall average.