The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2016
Filed:
Feb. 23, 2015
Tdk Corporation, Tokyo, JO;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Kunliang Zhang, Milpitas, CA (US);
Min Li, Dublin, CA (US);
Yue Liu, Fremont, CA (US);
Hideaki Fukuzawa, Tokyo, JP;
Hiromi Yuasa, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A method is described for forming a confining current path (CCP) spacer in a CPP-GMR sensor. A first Cu spacer, an amorphous metal/alloy layer such as Hf, a second Cu spacer, and an oxidizable layer such as Al, Mg, or AlCu are sequentially deposited on a ferromagnetic layer. A pre-ion treatment (PIT) and ion assisted oxidation (IAO) transform the amorphous layer into a first metal oxide template and the oxidizable layer into a second metal oxide template both having Cu metal paths therein. A third Cu layer is deposited on the second metal oxide template. The amorphous layer promotes smoothness and smaller grain size in the oxidizable layer to minimize variations in the metal paths and thereby improves dR/R, R, and dR uniformity by 50% or more.