The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Sep. 30, 2015
Freescale Semiconductor, Inc., Austin, TX (US);
Evgueniy Stefanov, Vieille Toulouse, FR;
Edouard Denis De Fresart, Tempe, AZ (US);
Moaniss Zitouni, Gilbert, AZ (US);
Freescale Semiconductor, Inc., Austin, TX (US);
Abstract
A bi-directional trench field effect power transistor. A layer stack extends over the top surface of the substrate, in which vertical trenches are present. An electrical path can be selectively enabled or disabled to allow current to flow in opposite directions through a body located laterally between the first and second vertical trenches. A shallow trench, more shallow than the first vertical trench and the second vertical trench is located between the first vertical trench and the second vertical trench and extend in the vertical direction from the top layer of the stack into the body, beyond an upper boundary of the body. The body is provided with a dopant, the concentration of the dopant is at least one order of magnitude higher in a region adjacent to the shallow trench than near the first vertical trench and the second vertical trench.