The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Apr. 29, 2015
Korea Institute of Machinery & Materials, Daejeon, KR;
KOREA INSTITUTE OF MACHINERY & MATERIALS, Daejeon, KR;
Abstract
A plasma reactor for abating hazardous materials included in process gases while being installed on an exhaust path of the process gases toward a vacuum pump is provided. The plasma reactor includes an insulator having a pipe shape through which process gases pass, a first ground electrode connected to a front end of the insulator facing the process chamber, a second ground electrode connected to a rear end of the insulator and provided with a facing part that faces a center of the inside of the insulator along the moving direction of process gases, and a driving electrode fixed to an external circumferential surface of the insulator and connected to a power supply applying an AC or RF voltage.