The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Feb. 21, 2013
Asml Netherlands B.v., Veldhoven, NL;
Fabrizio Evangelista, Eindhoven, NL;
Derk Jan Wilfred Klunder, Geldrop, NL;
Cornelis Cornelia De Bruijn, Halsteren, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode () provided on a face () of a semiconductor substrate () towards which the radiation beam is directed during operation of the lithographic apparatus, a first radiation blocking material () being provided around the photodiode on the face of the semiconductor substrate, and a second radiation blocking material () is provided on a side () of the semiconductor substrate upon which the radiation beam is incident during operation of the lithographic apparatus.