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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9470980 B1

PDFFull Text
Date of Patent:
Oct. 18, 2016

Filed:

Mar. 28, 2014

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Naoki Inoue, Shizuoka, JP;

Hiroo Takizawa, Shizuoka, JP;

Shuji Hirano, Shizuoka, JP;

Hideaki Tsubaki, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Brittany Raymond

Int. Cl.
CPC ...
G03F 7/20 (2006.01); C08F 212/14 (2006.01); G03C 1/73 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/075 (2006.01); G03F 7/32 (2006.01); C08F 12/24 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2002 (2013.01); C08F 212/14 (2013.01); G03C 1/733 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/0758 (2013.01); G03F 7/2039 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); C08F 12/24 (2013.01);
Abstract

A pattern-forming method includes in this order: step () of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation, (C) a resin having one or more groups selected from the specific group as defined in the specification and (D) a solvent; step () of exposing the film with an electron beam or extreme ultraviolet radiation; and step () of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.

Find Patent Forward Citations

Inoue, Naoki. (2016). Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device (U.S. Patent No. 9470980). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9470980

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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