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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9469712 B1

PDFFull Text
Date of Patent:
Oct. 18, 2016

Filed:

Mar. 12, 2014

Method of producing polymeric compound, resist composition and method of forming resist pattern

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Tomoyuki Hirano, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Junichi Tsuchiya, Kawasaki, JP;

Yoichi Hori, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
C08F 224/00 (2006.01); C08F 228/06 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
C08F 224/00 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); C08F 228/06 (2013.01);
Abstract

A method of producing a copolymer, including copolymerizing a monomer (am0) containing a partial structure represented by formula (am0-1) shown below, a monomer (am1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a monomer (am5) containing an —SO— containing cyclic group in the presence of a nitrogen-containing compound (X) having a conjugated acid with an acid dissociation constant of less than 10 (in the formula, *0 to *4 each represents a valence bond).

Find Patent Forward Citations

Hirano, Tomoyuki. (2016). Method of producing polymeric compound, resist composition and method of forming resist pattern (U.S. Patent No. 9469712). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9469712

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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