The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2016
Filed:
Jul. 29, 2014
Applicant:
Sandisk Technologies Inc., Plano, TX (US);
Inventors:
Tomoyasu Kakegawa, Mie, JP;
Takuya Futase, Mie, JP;
Katsuo Yamada, Mie, JP;
Keita Kumamoto, Mie, JP;
Hirotada Tobita, Mie, JP;
Assignee:
SanDisk Technologies LLC, Plano, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/311 (2006.01); H01L 21/02 (2006.01); H01L 27/115 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76831 (2013.01); H01L 21/0217 (2013.01); H01L 21/31144 (2013.01); H01L 21/76801 (2013.01); H01L 21/76802 (2013.01); H01L 21/76816 (2013.01); H01L 21/76897 (2013.01); H01L 27/11524 (2013.01);
Abstract
Contact holes are constrained to their designated active areas by etch-resistant walls so that they cannot contact adjacent active areas. Etch-resistant walls provide outer limits for any contact hole bending that may occur and thus keep contact holes substantially vertical. Mask openings for contact hole formation may be large so that they overlap etch-resistant walls.