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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9466490 B1

PDFFull Text
Date of Patent:
Oct. 11, 2016

Filed:

Jun. 16, 2015

Beam shapers, annealing systems employing the same, methods of heat treating substrates and methods of fabricating semiconductor devices

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sanghyun Kim, Daejeon, KR;

Chalykh Roman, Suwon-si, KR;

Jongju Park, Hwaseong-si, KR;

Donggun Lee, Hwaseong-si, KR;

Seongsue Kim, Seoul, KR;

Assignee:

Samsung Electronics Co., Ltd., , KR;

Attorney:

Onello & Mello, LLP

Primary Examiner:

Samuel M Heinrich

Int. Cl.
CPC ...
H01L 21/268 (2006.01); H01L 21/324 (2006.01); B23K 26/352 (2014.01); B23K 26/354 (2014.01); H01L 21/027 (2006.01); B23K 26/00 (2014.01); B23K 26/06 (2014.01); B23K 26/073 (2006.01); G03F 1/24 (2012.01); G02B 27/09 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 21/268 (2013.01); B23K 26/0081 (2013.01); B23K 26/037 (2015.10); B23K 26/06 (2013.01); B23K 26/064 (2015.10); B23K 26/073 (2013.01); B23K 26/352 (2015.10); B23K 26/354 (2015.10); G02B 27/0927 (2013.01); G02B 27/0955 (2013.01); G02B 27/0977 (2013.01); G02B 27/0988 (2013.01); G03F 1/24 (2013.01); H01L 21/0274 (2013.01); H01L 21/0275 (2013.01); H01L 21/0332 (2013.01); H01L 21/0337 (2013.01); H01L 21/324 (2013.01);
Abstract

A treatment system comprises an energy source that generates a energy beam that is emitted along an energy beam pathway. A beam section shaper is positioned along the energy beam pathway that receives an incident energy beam and modifies a section shape thereof to output a shape-modified energy beam. A beam intensity shaper is positioned along the energy beam pathway that receives an incident energy beam having a first intensity profile and outputs an intensity-modified energy beam having a second intensity profile, wherein the first intensity profile has a relative maximum average intensity at a center region thereof and wherein the second intensity profile has a relative minimum average intensity at a center region thereof.

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