The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2016

Filed:

Nov. 04, 2014
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Ted Ming-Lang Guo, Tainan, TW;

Chin-Cheng Chien, Tainan, TW;

Chueh-Yang Liu, Tainan, TW;

Neng-Hui Yang, Hsinchu, TW;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8242 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02334 (2013.01); H01L 21/0206 (2013.01); H01L 21/02181 (2013.01); H01L 21/02307 (2013.01); H01L 21/31111 (2013.01); H01L 21/31144 (2013.01);
Abstract

A cleaning process for oxide includes the following step. A substrate having a first area and a second area is provided. A first oxide layer is formed on the substrate of the first area and the second area. An ammonium hydroxide (NHOH) and hydrogen peroxide (HO) containing process is performed on the first oxide layer of the first area and the second area. A photoresist layer covers the first oxide layer of the first area while exposing the first oxide layer of the second area. The first oxide layer of the second area is removed. The photoresist layer is then removed.


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