The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2016
Filed:
Jul. 25, 2014
Globalfoundries Inc., Grand Cayman, KY;
Ahmed Hassan, Clifton Park, NY (US);
Nader Magdy Hindawy, Rexford, NY (US);
Vikrant Chauhan, Clifton Park, NY (US);
Jason Eugene Stephens, Albany, NY (US);
David Pritchard, Glenville, NY (US);
Abbas Guvenilir, Gansevoort, NY (US);
David E. Brown, Ballston Lake, NY (US);
Terry J. Bordelon, Jr., Niskayuna, NY (US);
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
One illustrative method disclosed herein involves, among other things, decomposing an initial circuit layout into first and second mask patterns, for the first mask pattern, identifying a first four-polygon pattern in the first mask pattern that violates a multi-polygon constraint rule, wherein the first four-polygon pattern comprises four polygons positioned side-by-side in the first mask pattern, and recoloring one or two of the polygons in the first four-polygon pattern in the first mask pattern to the second mask pattern to eliminate the first four-polygon pattern from the first mask pattern without introducing any design rule violations in the initial circuit layout.