logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9465291 B1

PDFFull Text
Date of Patent:
Oct. 11, 2016

Filed:

Mar. 07, 2014

Radiation-sensitive resin composition, polymer, compound, and method for producing compound

Applicant:

Jsr Corporation, Tokyo, JP;

Inventor:

Hayato Namai, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/26 (2006.01); C07D 307/93 (2006.01); C07C 69/54 (2006.01); C07D 333/78 (2006.01); C08F 20/10 (2006.01); C07D 307/935 (2006.01); C07D 307/77 (2006.01); C08F 220/40 (2006.01); C08F 22/10 (2006.01); G03C 1/73 (2006.01); G03F 7/11 (2006.01); G03F 7/38 (2006.01); C08F 220/28 (2006.01); C08L 33/14 (2006.01); C07D 317/36 (2006.01); C07D 317/70 (2006.01); C07D 491/056 (2006.01); C07D 493/04 (2006.01); C07D 307/33 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C07C 69/54 (2013.01); C07D 307/33 (2013.01); C07D 307/77 (2013.01); C07D 307/93 (2013.01); C07D 307/935 (2013.01); C07D 317/36 (2013.01); C07D 317/70 (2013.01); C07D 333/78 (2013.01); C07D 491/056 (2013.01); C07D 493/04 (2013.01); C08F 20/10 (2013.01); C08F 22/10 (2013.01); C08F 220/28 (2013.01); C08F 220/40 (2013.01); C08L 33/14 (2013.01); G03C 1/73 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/2041 (2013.01); G03F 7/38 (2013.01); C07C 2101/08 (2013.01); C07C 2101/10 (2013.01); C07C 2101/14 (2013.01); C07C 2101/16 (2013.01); C07C 2102/28 (2013.01); C07C 2102/42 (2013.01);
Abstract

A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. Ris a hydrogen atom, a fluorine atom, or the like. Ris a hydrogen atom or a monovalent hydrocarbon group. Ris a hydrogen atom, a monovalent chain hydrocarbon group, or the like. Ris a hydrogen atom, a monovalent chain hydrocarbon group, or the like. Ris a hydrogen atom, a monovalent chain hydrocarbon group, or the like. Ris a monovalent chain hydrocarbon group. Ris bonded to Rto form a first alicyclic structure, or Ris bonded to Rto form a second alicyclic structure. At least one hydrogen atom of R, R, or Ris optionally substituted with a fluorine atom.

Find Patent Forward Citations

Loading…