The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 2016

Filed:

Jan. 27, 2014
Applicant:

Altera Corporation, San Jose, CA (US);

Inventors:

Jun Liu, Milpitas, CA (US);

Qi Xiang, San Jose, CA (US);

Assignee:

Altera Corporation, San Jose, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C 11/00 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78 (2013.01);
Abstract

Integrated circuits with memory circuitry are provided. The memory circuitry may include memory cell transistors and associated pass transistors. The memory cell transistors and the pass transistors may be formed using multiple strips of oxide definition (OD) regions coupled in parallel. The multiple OD strips may have reduced widths. The ratio of the distance from adjacent OD strips to a given OD strip to the width of the given OD strip may be at least 0.5. Forming memory circuitry transistors using this multi-strip arrangement may provide increased levels of stress that improve transistor performance. Each OD strip may have a reduced width that still satisfies fabrication design rules. Forming OD regions having reduced width allows the pass transistors to be overdriven at higher voltage levels to further improve transistor performance.


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