The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 2016

Filed:

Jun. 15, 2015
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Yufei Xiong, Chengdu, CN;

Yunlong Liu, Chengdu, CN;

Hong Yang, Richardson, TX (US);

Jianxin Liu, Chengdu, CN;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 27/108 (2006.01); H01L 29/423 (2006.01); H01L 27/088 (2006.01); H01L 27/06 (2006.01); H01L 49/02 (2006.01); H01L 29/78 (2006.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
H01L 29/42364 (2013.01); H01L 21/2822 (2013.01); H01L 21/28185 (2013.01); H01L 21/28202 (2013.01); H01L 21/28238 (2013.01); H01L 21/308 (2013.01); H01L 21/3065 (2013.01); H01L 27/0629 (2013.01); H01L 27/088 (2013.01); H01L 28/40 (2013.01); H01L 29/4236 (2013.01); H01L 29/7827 (2013.01);
Abstract

An integrated circuit including a trench in the substrate with a high quality trench oxide grown on the sidewalls and the bottom of the trench where the ratio of the thickness of the high quality trench oxide formed on the sidewalls to the thickness formed on the bottom is less than 1.2. An integrated circuit including a trench with high quality oxide is formed by first growing a sacrificial oxide in dilute oxygen at a temperature in the range of 1050° C. to 1250° C., stripping the sacrificial oxide, growing high quality oxide in dilute oxygen plus trans 1,2 dichloroethylene at a temperature in the range of 1050° C. to 1250° C., and annealing the high quality oxide in an inert ambient at a temperature in the range of 1050° C. to 1250° C.


Find Patent Forward Citations

Loading…