The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2016
Filed:
Jul. 11, 2013
Mitutoyo Corporation, Kawasaki-shi, Kanagawa-ken, JP;
Mark Lawrence Delaney, Shoreline, WA (US);
Mitutoyo Corporation, Kawasaki-shi, JP;
Abstract
A method improves focus height repeatability in a machine vision inspection system. A region of interest is defined within a field of view imaged by a camera portion, wherein an aligned edge feature in the region of interest may introduce a focus height sensitivity that varies depending on the aligned edge feature offset relative to the image pixels. A first set of focus-determining operations determines a focus height for the region of interest, and comprise at least one of: (a) operations that reduce the sensitivity of the focus height determination to the offset of the aligned edge feature relative to the image pixels; and (b) operations that adjust the offset of the aligned edge feature relative to the image pixels according to a predetermined offset repeatability criteria, such that the image data used in the focus height determination fulfills the offset repeatability criteria.