The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2016

Filed:

Dec. 17, 2010
Applicants:

Harry A. Atwater, South Pasadena, CA (US);

Marina S. Leite, Pasadena, CA (US);

Emily C. Warmann, Riverside, CA (US);

Dennis M. Callahan, Los Angeles, CA (US);

Inventors:

Harry A. Atwater, South Pasadena, CA (US);

Marina S. Leite, Pasadena, CA (US);

Emily C. Warmann, Riverside, CA (US);

Dennis M. Callahan, Los Angeles, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/18 (2006.01);
U.S. Cl.
CPC ...
H01L 21/187 (2013.01);
Abstract

A virtual substrate includes a handle support and a strain-relieved single crystalline layer on the handle support. A method of making the virtual substrate includes growing a coherently-strained single crystalline layer on an initial growth substrate, removing the initial growth substrate to relieve the strain on the single crystalline layer, and applying the strain-relieved single crystalline layer on a handle support.


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