The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2016

Filed:

Dec. 17, 2014
Applicant:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Inventor:

Simon Diemer, Röttingen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/15 (2006.01); H01J 37/147 (2006.01); H01J 37/12 (2006.01); H01J 37/285 (2006.01);
U.S. Cl.
CPC ...
H01J 37/147 (2013.01); H01J 37/12 (2013.01); H01J 37/15 (2013.01); H01J 37/285 (2013.01); H01J 2237/12 (2013.01); H01J 2237/15 (2013.01); H01J 2237/153 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/285 (2013.01);
Abstract

A method of adjusting a stigmator in a particle beam apparatus comprises directing a particle beam onto a sample wherein the particle beam traverses a quadrupole fieldgenerated by energizing at least four field generators of the stigmator; acquiring first and second images of the sample at different field strengths of the quadrupole field while energizing the at least four field generators according to a first setting of a plurality of settings; acquiring third and fourth images of the sample at different field strengths of the quadrupole fieldwhile energizing the at least four field generators according to a second setting of the plurality of settings; determining a plurality of image displacements based on the first, second, third and fourth images; determining an optimum setting of the at least four field generators based on the plurality of image displacements and the plurality of settings.


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