The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2016
Filed:
Feb. 26, 2013
International Business Machines Corporation, Armonk, NY (US);
John B. Campi, Jr., Westford, VT (US);
Robert J. Gauthier, Jr., Hinesburg, VT (US);
Junjun Li, Williston, VT (US);
Souvick Mitra, Essex Junction, VT (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
Disclosed is a test structure that can be used to characterize a specific interface resistance within a multi-layer conductive structure, such as a multi-layer ohmic contact. In the test structure first and second transmission line model (TLM) structures both incorporate a row of essentially identical contact pads separated by spaces with progressively increasing lengths. Conductive mesas, also with progressively increasing lengths, are positioned within the spaces between all but the initial pair of adjacent contacts pads. The first and second TLM structures differ only with respect to the presence of a single conductive layer on each of the conductive mesas. System, method and computer program product embodiments are able to extract resistance parameters associated with the first and second TLM structures, including conductive mesa to conductive layer interface resistances, based current-voltage measurements acquired from both of the TLM structures.