The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Apr. 24, 2014
David H. Levy, Rochester, NY (US);
Daniele Margadonna, Ciampino, IT;
Dennis Flood, Oberlin, OH (US);
Wendy G. Ahearn, Rochester, NY (US);
Richard W. Topel, Jr., Rochester, NY (US);
Theodore Zubil, Honeoye Falls, NY (US);
David H. Levy, Rochester, NY (US);
Daniele Margadonna, Ciampino, IT;
Dennis Flood, Oberlin, OH (US);
Wendy G. Ahearn, Rochester, NY (US);
Richard W. Topel, Jr., Rochester, NY (US);
Theodore Zubil, Honeoye Falls, NY (US);
Natcore Technology, Inc., Rochester, NY (US);
Abstract
A method for an improved doping process allows for improved control of doping concentrations on a substrate. The method may comprise printing a polymeric material on a substrate in a desired pattern; and depositing a barrier layer on the substrate with a liquid phase deposition process, wherein a pattern of the barrier layer is defined by the polymeric material. The method further comprises removing the polymeric material, and doping the substrate. The barrier layer substantially prevents or reduces doping of the substrate to allow patterned doping regions to be formed on the substrate. The method can be repeated to allow additional doping regions to be formed on the substrate.