The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Sep. 15, 2011
Ryo Nakayama, Utsunomiya, JP;
Kouichirou Tsujita, Utsunomiya, JP;
Koji Mikami, Nikko, JP;
Hiroyuki Ishii, Shioya-gun, JP;
Ryo Nakayama, Utsunomiya, JP;
Kouichirou Tsujita, Utsunomiya, JP;
Koji Mikami, Nikko, JP;
Hiroyuki Ishii, Shioya-gun, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A recording medium stores a program for causing a computer to execute a method of calculating a resist pattern. The method includes: a first step of calculating a light intensity distribution of an optical image formed on the resist, based on the reticle pattern and an exposure condition; a second step of convoluting, using a first diffusion length, the calculated light intensity distribution; a third step of calculating a representative light intensity from the calculated light intensity distribution or the convoluted light intensity distribution; a fourth step of correcting the convoluted light intensity distribution by adding, to the convoluted light intensity distribution, a correction function including a first function given by: where J is the distribution of the representative light intensity; and a fifth step of calculating the resist pattern based on the corrected light intensity distribution and a slice level set in advance.