The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2016

Filed:

May. 13, 2015
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Xinrong Jiang, Palo Alto, CA (US);

Liqun Han, Pleasanton, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 37/05 (2006.01); H01J 37/06 (2006.01); H01J 37/10 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/26 (2013.01); H01J 37/05 (2013.01); H01J 37/06 (2013.01); H01J 37/10 (2013.01); H01J 37/28 (2013.01); H01J 2237/057 (2013.01);
Abstract

One embodiment relates to a dual Wien-filter monochromator. A first Wien filter focuses an electron beam in a first plane while leaving the electron beam to be parallel in a second plane. A slit opening allows electrons of the electron beam having an energy within an energy range to pass through while blocking electrons of the electron beam having an energy outside the energy range. A second Wien filter focuses the electron beam to become parallel in the first plane while leaving the electron beam to be parallel in the second plane. Other embodiments, aspects and features are also disclosed.


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