The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2016

Filed:

Mar. 27, 2015
Applicant:

Nanyang Polytechnic, Singpore, SG;

Inventors:

Oh Tiong Keng, Singapore, SG;

Koh Wing Onn, Singapore, SG;

Zhu Hui, Singapore, SG;

Assignee:

NANYANG POLYTECHNIC, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/16 (2006.01); G01L 1/24 (2006.01);
U.S. Cl.
CPC ...
G01B 11/16 (2013.01); G01L 1/24 (2013.01);
Abstract

This invention relates to a system and a method for measuring strain of a specimen on a strain measurement system having an image capturing device, a spatial light modulator, a first light source, a second light source and a beam switching controller. The system receives parameters from an input from a user and generates a lenslet pattern to be transmitted to the spatial light modulator. The system transmits a frequency and switching sequence to the beam switching controller to alternate the first and second light sources and activate the image capturing device to capture images. The system receives a first image captured by the image capturing device caused by a beam of the first light source and a second image captured by the image capturing device caused by a beam of the second light source. Based on the first and second images received, the system optimizes the image capturing device.


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