The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
Sep. 20, 2012
Shin-etsu Chemical Co., Ltd., Chiyoda-ku, JP;
Shin-Etsu Chemical Co., Ltd., Chiyoda-ku, JP;
Abstract
In order to obtain a polycrystalline silicon rod having an excellent shape, the placement relation between a source gas supplying nozzleand metal electrodesthat are provided in a reactor is appropriately designed. The area of a disc-like base plateis S. An imaginary concentric circle C (radius c) centered at the center of the disc-like base platehas an area S=S/2. Further, a concentric circle A and a concentric circle B are imaginary concentric circles having the same center as that of the concentric circle C and having a radius a and a radius b, respectively (a<b<c). In the present invention, the electrode pairsare placed inside of the imaginary concentric circle C and outside of the imaginary concentric circle B, and the gas supplying nozzle 9 is placed inside of the imaginary concentric circle A.