The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2016

Filed:

Oct. 26, 2012
Applicant:

Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);

Inventors:

William T. Weaver, Austin, TX (US);

Charles T. Carlson, Cedar Park, TX (US);

Joseph C. Olson, Beverly, MA (US);

James Buonodono, Amesbury, MA (US);

Paul Sullivan, Wenham, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/20 (2006.01); H01J 37/302 (2006.01); H01J 37/317 (2006.01); H01L 21/266 (2006.01); H01L 21/67 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/3023 (2013.01); H01J 37/3171 (2013.01); H01L 21/266 (2013.01); H01L 21/67213 (2013.01); H01L 31/18 (2013.01); H01L 31/1804 (2013.01); H01J 2237/024 (2013.01); H01J 2237/31711 (2013.01); Y02E 10/547 (2013.01); Y02P 70/521 (2015.11);
Abstract

One embodiment of this ion implanter includes an ion source and a process chamber. This process chamber is connected to the ion source and separated from the ion source by a plurality of extraction electrodes. A carrier holds multiple workpieces. A mask loader in the process chamber connects a mask to the carrier. A transfer chamber and load lock may be connected to the process chamber. The ion implanter is configured to perform either blanket or selective implantation of the workpieces.


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