The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2016

Filed:

Oct. 17, 2014
Applicants:

Byong-hyun Jang, Suwon-si, KR;

Dong-chul Yoo, Seongnam-si, KR;

Ki-hyun Hwang, Seongnam-si, KR;

Phil-ouk Nam, Hwaseong-si, KR;

Jae-young Ahn, Seongnam-si, KR;

Inventors:

Byong-Hyun Jang, Suwon-si, KR;

Dong-Chul Yoo, Seongnam-si, KR;

Ki-Hyun Hwang, Seongnam-si, KR;

Phil-Ouk Nam, Hwaseong-si, KR;

Jae-Young Ahn, Seongnam-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/115 (2006.01); H01L 29/66 (2006.01); H01L 29/792 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11565 (2013.01); H01L 27/1158 (2013.01); H01L 29/66833 (2013.01); H01L 29/7926 (2013.01);
Abstract

Nonvolatile memory devices include at least four cylindrical-shaped channel regions, which extend vertically from portions of a substrate located at respective vertices of at least one rhomboid when viewed in a vertical direction relative to a surface of the substrate. A charge storage layer (e.g., ONO layer) is provided on an outer sidewall of each of the cylindrical-shaped channel regions. In addition, to achieve a high degree of integration, a plurality of vertically-stacked gate electrodes are provided, which extend adjacent each of the cylindrical-shaped channel regions.


Find Patent Forward Citations

Loading…