The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Mar. 04, 2015
Applicant:
Fujikoshi Machinery Corp., Nagano-shi, Nagano, JP;
Inventors:
Kazutaka Shibuya, Nagano, JP;
Yoshio Nakamura, Nagano, JP;
Assignee:
FUJIKOSHI MACHINERY CORP., Nagano, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); B24B 37/04 (2012.01); B24B 57/02 (2006.01); C23F 1/08 (2006.01); C23F 1/12 (2006.01); C23F 1/14 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01); H01L 29/16 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); B24B 37/04 (2013.01); B24B 57/02 (2013.01); C23F 1/08 (2013.01); C23F 1/12 (2013.01); C23F 1/14 (2013.01); H01J 37/32055 (2013.01); H01J 37/32073 (2013.01); H01J 37/32348 (2013.01); H01L 21/02024 (2013.01); H01L 21/67075 (2013.01); H01L 21/67092 (2013.01); H01L 29/1602 (2013.01); H01L 29/1608 (2013.01); H01L 29/2003 (2013.01);
Abstract
The method of the present invention is capable of polishing a high hardness work at high polishing efficiency. The method comprises the steps of: pressing a surface of the work onto a polishing part of a rotating polishing plate; and supplying slurry while performing the pressing step. The method is characterized in that an activated gas, which has been activated by gas discharge, is turned into bubbles and mixed into the slurry.