The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2016

Filed:

Jul. 02, 2014
Applicant:

Gtat Corporation, Merrimack, NH (US);

Inventors:

Wenjun L Chinn, Missoula, MT (US);

F. Scott Fahrenbruck, Missoula, MT (US);

Shawn D Skinner, Missoula, MT (US);

Laura E Moran, Missoula, MT (US);

Jeffrey C. Gum, Stevensville, MT (US);

Assignee:

GTAT Corporation, Merrimack, NH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/442 (2006.01); C23C 16/24 (2006.01); C23C 16/52 (2006.01); C23C 16/44 (2006.01); C01B 33/027 (2006.01);
U.S. Cl.
CPC ...
C23C 16/442 (2013.01); C01B 33/027 (2013.01); C23C 16/24 (2013.01); C23C 16/4417 (2013.01); C23C 16/52 (2013.01);
Abstract

A reverse fluidized bed reactor (FBR) is separated by a thermally insulating vertical divider into a pre-reaction heating zone, a reaction zone, and a dehydrogenation zone. The dehydrogenation zone can be distinct, or the heating zone can serve as the dehydrogenation zone. Particles of polysilicon circulate upward through the heating zone and into the top of the reaction zone, where deposition of silicon occurs, and the grown particles slowly settle until they reenter the bottom of the pre-reaction heating zone. Dust formation, wall deposition, and hydrogen content in the product silicon particles are thereby minimized.


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