The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2016

Filed:

Feb. 27, 2012
Applicants:

Tsuyoshi Chiba, Tokyo, JP;

Hiroshi Fujita, Tokyo, JP;

Yuki Aritsuka, Tokyo, JP;

Inventors:

Tsuyoshi Chiba, Tokyo, JP;

Hiroshi Fujita, Tokyo, JP;

Yuki Aritsuka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); B29D 11/00 (2006.01); C09D 183/06 (2006.01); B32B 5/14 (2006.01); B32B 27/28 (2006.01); H05K 1/03 (2006.01); B82Y 20/00 (2011.01); G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
B29D 11/00346 (2013.01); B32B 5/145 (2013.01); B32B 27/283 (2013.01); B82Y 20/00 (2013.01); C09D 183/06 (2013.01); G02B 5/3066 (2013.01); H05K 1/036 (2013.01); Y10T 428/24355 (2015.01); Y10T 428/24967 (2015.01); Y10T 428/31663 (2015.04);
Abstract

A PDMS sheet that ensures good adhesion, handleability and stability to metal thin films or metal patterns of any desired shape, an optical element that is kept against de-bonding or exfoliation of metal patterns and has high reliability as well as good handleability and stability, and manufacturing methods thereof. The inventive optical element comprises a polydimethyl-siloxane sheet having a pattern-formation surface defined by one surface and a base surface defined by another surface, and a plurality of metal patterns positioned on the pattern-formation surface. Given a low-molecular-weight siloxane of a cyclic structure represented by [—Si(CH)O—]where k is an integer of 3 to 20 inclusive, polydimethylsiloxane sheet comprises a structure where the content of the low-molecular-weight siloxane at the pattern-formation surface is more than that of the low-molecular-weight siloxane at the base surface, and a spacing between the adjacent metal patterns is variable by deformation of the polydimethylsiloxane sheet.


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