The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Mar. 23, 2015
Applicant:
Ajinomoto Co., Inc., Tokyo, JP;
Inventor:
Masahiro Ino, Kawasaki, JP;
Assignee:
AJINOMOTO CO., INC., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/12 (2006.01); C11D 3/28 (2006.01); C11D 3/20 (2006.01); A61K 8/49 (2006.01); C11D 1/28 (2006.01); C11C 1/06 (2006.01); C11D 1/29 (2006.01); C11D 1/04 (2006.01); A61Q 19/10 (2006.01); A61K 8/46 (2006.01); A61K 8/34 (2006.01); A61K 8/81 (2006.01); A61K 8/92 (2006.01); A61Q 5/02 (2006.01);
U.S. Cl.
CPC ...
A61K 8/494 (2013.01); A61K 8/345 (2013.01); A61K 8/463 (2013.01); A61K 8/466 (2013.01); A61K 8/8147 (2013.01); A61K 8/92 (2013.01); A61Q 5/02 (2013.01); A61Q 19/10 (2013.01); C11C 1/06 (2013.01); C11D 1/04 (2013.01); C11D 1/12 (2013.01); C11D 1/28 (2013.01); C11D 1/29 (2013.01); C11D 3/28 (2013.01);
Abstract
A cleansing agent composition containing wherein Rand Rare each independently a hydrogen atom, a methyl group, a hydroxymethyl group, or a hydroxyethyl group, shows high detergency and low irritativeness, can suppress rough skin after washing and drying, and can be preferably used for cosmetic agents.