The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9424372 B1

Date of Patent:

Aug. 23, 2016

Filed:

Mar. 15, 2013

System and method for data path handling, shot count minimization, and proximity effects correction related to mask writing process

Applicant:

D2s, Inc., San Jose, CA (US);

Inventors:

Ilhami H. Torunoglu, Monte Sereno, CA (US);

Ahmet Karakas, Palo Alto, CA (US);

Assignee:

D2S, Inc., San Jose, CA (US);

Attorney:

The Mueller Law Office, P.C.

Primary Examiner:

A M Thompson

Int. Cl.

CPC ...

G03F 7/00 (2006.01); G06F 17/50 (2006.01); G03F 7/20 (2006.01);

U.S. Cl.

CPC ...

G06F 17/50 (2013.01); G03F 7/70466 (2013.01);

Abstract

A system and method for mask data preparation (MDP) uses pixel processing algorithms running on parallel processing platforms such as central processing units (CPUs) and graphical processing units (GPUs). Proximity effects correlation, dose, and bias corrections are performed on a pixel basis. In some embodiments, striping of a decorated database in parallel using multiple graphic processors is performed. While performing a first light path simulation for a first stripe for a mask, a second light path simulation is performed for a second stripe for the mask. Using a result of the striping and first and second light path simulations, dose adjustment during a mask processing on a pixel of the mask is performed.

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