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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9423299 B1

PDFFull Text
Date of Patent:
Aug. 23, 2016

Filed:

Oct. 31, 2014

Exposure apparatus, exposure method, and device manufacturing method

Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Kazuki Yamamoto, Shimotsuke, JP;

Tadahiro Asaishi, Utsunomiya, JP;

Assignee:

CANON KABUSHIKI KAISHA, Tokyo, JP;

Attorney:

Rossi, Kimms & McDowell LLP

Primary Examiner:

Colin Kreutzer

Int. Cl.
CPC ...
G01B 11/00 (2006.01); G03B 27/32 (2006.01); G03B 27/54 (2006.01); G03B 27/74 (2006.01); H01S 3/13 (2006.01); G01J 1/42 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01); G01J 1/32 (2006.01); H01S 5/0683 (2006.01);
U.S. Cl.
CPC ...
G01J 1/429 (2013.01); G01J 1/32 (2013.01); G03F 7/70041 (2013.01); G03F 7/70516 (2013.01); G03F 7/70558 (2013.01); G03F 9/7003 (2013.01); G03F 9/7092 (2013.01); H01S 5/0683 (2013.01);
Abstract

An exposure apparatus is provided with a light source for emitting pulse light and exposes a substrate via to the pulse light an original. Further, the exposure apparatus comprises a detection unit for detecting the light quantity of the pulse light and a controller for controlling the light source and the detection unit. Here, the controller is configured to execute a first calibration process for obtaining a relation between a control input to the light source and a light quantity of a pulse light from the light source, based on light quantities of a plurality of pulse lights detected by the detector by causing the light source to emit the plurality of the pulse lights with a plurality of the control input, in parallel with execution of a second calibration process which is different from the first calibration process and executed using the plurality of pulse lights.

Find Patent Forward Citations

Yamamoto, Kazuki. (2016). Exposure apparatus, exposure method, and device manufacturing method (U.S. Patent No. 9423299). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9423299

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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