The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2016

Filed:

Mar. 25, 2015
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Takumi Namiki, Kawasaki, JP;

Tomoya Kumagai, Kawasaki, JP;

Kento Asoya, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/30 (2013.01); G03F 7/32 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); G03F 7/327 (2013.01);
Abstract

A coating agent for forming a fine pattern capable of simultaneously achieving slimming and roughness reduction of a positive-type resist pattern without deteriorating the cross-sectional shape of the slimmed positive type resist pattern and a method of slimming treatment of a positive-type resist pattern using the above coating agent for forming a fine pattern. A coating agent comprising a nitrogen-containing compound with a specific structure and an organic solvent is used as the coating agent for forming fine pattern used for a positive-type resist pattern. The coating agent may include a basic nitrogen-containing compound and/or a water-soluble polymer or an alkali-soluble polymer.


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