The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Jun. 10, 2014
Micron Technology, Inc., Boise, ID (US);
Katsuya Kato, Tokyo, JP;
Micron Technology, Inc., Boise, ID (US);
Abstract
A photo mask includes a plurality of dark patterns disposed on a transparent substrate, a first region, a shield region, and a second region. The first region includes the dark patterns that are disposed with a wider space than a first distance. The shield region is adjacent to the first region on the transparent substrate and is filled with the dark pattern. The second region is faced to the first region across the shield region and includes the dark patterns that are disposed with a narrower space than a second distance. The second distance is narrower than ninety percent of the first distance.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile